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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond (Springer Thes,Used Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond (Springer Thes,Used
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Investigation on SiGe Selective Epitaxy for Source and Drain Engineering...
This thesis presents the SiGe source and drain (S/D) technology in the context of advanced CMOS, and addresses both device processing and epitaxy modelling.As the...
Sale price$70.12 Regular price$100.17
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