Handbook Of Vlsi Microlithography: Principles, Technology And Applications (Materials Science And Process Technology)

Handbook Of Vlsi Microlithography: Principles, Technology And Applications (Materials Science And Process Technology)

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This Handbook Gives Readers A Close Look At The Entire Technology Of Printing Very High Resolution And High Density Integrated Circuit (Ic) Patterns Into Thin Resist Process Transfer Coatings Including Optical Lithography, Electron Beam, Ion Beam, And Xray Lithography. The Book'S Main Theme Is The Special Printing Process Needed To Achieve Volume High Density Ic Chip Production, Especially In The Dynamic Random Access Memory (Dram) Industry.The Book Leads Off With A Comparison Of Various Lithography Methods, Covering The Three Major Patterning Parameters Of Line/Space, Resolution, Line Edge And Pattern Feature Dimension Control. The Book'S Explanation Of Resist And Resist Process Equipment Technology May Well Be The First Practical Description Of The Relationship Between The Resist Process And Equipment Parameters. The Basics Of Resist Technology Are Completely Covered Including An Entire Chapter On Resist Process Defectivity And The Potential Yield Limiting Effect On Device Production.Each Alternative Lithographic Technique And Testing Method Is Considered And Evaluated: Basic Metrology Including Optical, Scanningelectronmicroscope (Sem) Techniques And Electrical Test Devices, Along With Explanations Of Actual Printing Tools And Their Design, Construction And Performance. The Editor Devotes An Entire Chapter To Today'S Sophisticated, Complex Electronbeam Printers, And To The Emerging Xray Printing Technology Now Used In Highdensity Cmos Devices. Energetic Ion Particle Printing Is A Controllable, Steerable Technology That Does Not Rely On Resist, And Occupies A Final Section Of The Handbook.

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Frequently Asked Questions

  • Q: What is the main focus of the Handbook of VLSI Microlithography? A: The handbook focuses on the technology of printing high-resolution integrated circuit patterns using various lithography techniques, particularly emphasizing processes needed for high-density IC chip production in the DRAM industry.
  • Q: What types of lithography methods are covered in the book? A: The book covers several lithography methods including optical lithography, electron beam lithography, ion beam lithography, and x-ray lithography.
  • Q: Who is the author of the Handbook of VLSI Microlithography? A: The author of the handbook is William B. Glendinning.
  • Q: How many pages does the Handbook of VLSI Microlithography contain? A: The handbook contains 680 pages.
  • Q: What is the publication date of this book? A: The book was published on January 15, 1991.
  • Q: What kind of condition is the book in? A: The book is listed as being in new condition.
  • Q: What is the binding type of the Handbook of VLSI Microlithography? A: The book is bound in hardcover.
  • Q: What specific topics related to lithography does the book discuss? A: The book discusses various lithographic techniques, resist technology, defectivity in resist processes, and evaluates testing methods including metrology and actual printing tools.
  • Q: Is this book suitable for beginners in VLSI microlithography? A: While the book provides comprehensive information on lithography techniques, it is more suitable for readers with some background knowledge in materials science and process technology.
  • Q: What edition of the Handbook of VLSI Microlithography is available? A: The available edition is the first edition.