Highk materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2based dielectrics for future DRAM ap,Used

Highk materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2based dielectrics for future DRAM ap,Used

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SKU: DADAX3838130189
Brand: Sudwestdeutscher Verlag Fur Hochschulschriften AG
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I would like to give you an outstanding opportunity to experience more about modern materials for Dynamic Random Access Memories. Therefore I give this book into your hands. You will find here a theory chapter focusing on DRAM physics as well as a deep description of deposition and characterization methods used in this work. Finally, you will discover how to engineer materials on an atomic scale and how to investigate those thin films.

⚠️ WARNING (California Proposition 65):

This product may contain chemicals known to the State of California to cause cancer, birth defects, or other reproductive harm.

For more information, please visit www.P65Warnings.ca.gov.

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