Photoresist: Materials and Processes,Used

Photoresist: Materials and Processes,Used

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SKU: SONG0070162301
UPC: 9780070162303
Brand: McGraw-Hill Education
Condition: Used
$37.15
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Wonderful book to own.

⚠️ WARNING (California Proposition 65):

This product may contain chemicals known to the State of California to cause cancer, birth defects, or other reproductive harm.

For more information, please visit www.P65Warnings.ca.gov.

  • Q: What is the main topic of 'Photoresist: Materials and Processes'? A: The book covers the materials and processes involved in photoresist applications, primarily in photography and video.
  • Q: Who is the author of this book? A: The author of 'Photoresist: Materials and Processes' is William S. Deforest.
  • Q: What is the condition of the book? A: The book is in good condition.
  • Q: How many pages does the book have? A: The book contains a total of 288 pages.
  • Q: What type of binding does the book have? A: The book is bound in hardcover.
  • Q: When was 'Photoresist: Materials and Processes' published? A: The book was published on January 1, 1975.
  • Q: Is there any specific material mentioned for the book's cover? A: No specific material is mentioned for the cover in the product details.
  • Q: In which category is this book listed? A: This book is categorized under Photography & Video.
  • Q: What makes this book a good choice for readers? A: The book is described as a wonderful resource for anyone interested in the materials and processes related to photoresist.
  • Q: Is there an edition or release date for this book? A: No specific edition or release date is provided in the product details.

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