Plasmaprocessinginduced Damage Of Thin Dielectric Films,Used

Plasmaprocessinginduced Damage Of Thin Dielectric Films,Used

In Stock
SKU: DADAX3843387583
Brand: LAP Lambert Academic Publishing
Condition: New
$113.92
Quantity
Add to wishlist
Add to compare

Sold by Ergodebooks, an authorized reseller.

Returns accepted within 30 days | support@ergodebooks.com

Verified
Shipping Information
  • Free Standard Shipping — United States only
  • Processing Time: 1–3 business days
  • Estimated Delivery: 3–5 business days after dispatch
  • Double-boxed, fully insured & discreetly packaged
  • Tracking number sent via email once dispatched
  • Orders over $250 require signature upon delivery. Taxes calculated at checkout.
Returns & Refund

Returns accepted within 30 days of delivery.

Damaged or Defective Item

Free return shipping + replacement or full refund

Wrong Item Received

Free return shipping + replacement or full refund

Change of Mind

Return shipping at customer's expense · 25% restocking fee applies

All returns require a Return Authorization (RA) number before sending.

To initiate a return, contact us:

support@ergodebooks.com +1 (281) 738-1050
View Full Return & Refund Policy
Payment Option
Payment Methods

Help

If you have any questions, you are always welcome to contact us. We'll get back to you as soon as possible, withing 24 hours on weekdays.

Customer service

All questions about your order, return and delivery must be sent to our customer service team by e-mail at yourstore@yourdomain.com

Sale & Press

If you are interested in selling our products, need more information about our brand or wish to make a collaboration, please contact us at press@yourdomain.com

In semiconductor industry, material property degradation due to process is a critical factor that limits the device performance. Processinduced damage on a variety of dielectric materials is discussed and measured. Results from various metrologies are packaged and correlated into systematic theory. Chargeinduced, chemical, and physical damage source in plasma process environment is identified and optimized. Two sample types of dielectrics are investigated: highk dielectrics used in device technology and lowk dielectrics as observed in interconnect technology.

⚠️ WARNING (California Proposition 65):

This product may contain chemicals known to the State of California to cause cancer, birth defects, or other reproductive harm.

For more information, please visit www.P65Warnings.ca.gov.

Recently Viewed