Plasmaprocessinginduced Damage Of Thin Dielectric Films,Used

Plasmaprocessinginduced Damage Of Thin Dielectric Films,Used

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SKU: DADAX3843387583
Brand: LAP Lambert Academic Publishing
Sale price$113.92 Regular price$162.74
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In semiconductor industry, material property degradation due to process is a critical factor that limits the device performance. Processinduced damage on a variety of dielectric materials is discussed and measured. Results from various metrologies are packaged and correlated into systematic theory. Chargeinduced, chemical, and physical damage source in plasma process environment is identified and optimized. Two sample types of dielectrics are investigated: highk dielectrics used in device technology and lowk dielectrics as observed in interconnect technology.

⚠️ WARNING (California Proposition 65):

This product may contain chemicals known to the State of California to cause cancer, birth defects, or other reproductive harm.

For more information, please visit www.P65Warnings.ca.gov.

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